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Manufacturer
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Aspex |
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Model
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Explorer |
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Instrument Type
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SEM / EDS |
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Description
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A focused beam of electrons to produces a high resolution image of a sample in the range of a few nanometers, as well as other signals containing topographical and compositional information. |
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Key Features
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2-25 kV e-beam, equipped with a secondary electron detector, quad back scatter electron detectors, x-ray detector, variable pressure mode allows imaging of some insulating samples. |
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Material Restrictions
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Clean, dry, low-outgassing substrates, must be stable under mechanical vacuum, no magnetic samples, sputter coating of insulating samples may be necessary. |
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