ChemSols Spincoater



A spincoater is used to apply photoresist to wafers as part of the lithography process.

A vacuum chuck is used to hold the wafer down as it spins.

Typical spin speeds are between 1,000 and 5,000 rpm.


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Manufacturer: ChemSols

Model: Spin Coater CSS-05

Instrument Type: Spin Coater

Description: A device used to apply uniform thin films to the surface of a flat substrate.

Key Features: Dual stage timer for separate spread and drawing steps, spread time 0-18 sec, dry time 0-60 sec, variable speed 600-1000 rpm.

Materials Restrictions: Locally flat substrates less than 4 cm and larger than 1.5 cm in diameter.

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